The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Apr. 11, 2011
Applicants:

Olivier Braun, Castres, FR;

Paul Mallo, Croissy-sur-Seine, FR;

Inventors:

Olivier Braun, Castres, FR;

Paul Mallo, Croissy-sur-Seine, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/33 (2006.01); A61Q 19/00 (2006.01); A61K 8/81 (2006.01); C08F 220/58 (2006.01); C09D 133/26 (2006.01); A61Q 1/14 (2006.01); A61Q 5/00 (2006.01); A61Q 5/02 (2006.01); A61Q 17/04 (2006.01); A61Q 19/04 (2006.01); A61Q 19/06 (2006.01); C08F 220/28 (2006.01); C08F 222/38 (2006.01);
U.S. Cl.
CPC ...
A61K 8/8158 (2013.01); A61K 8/33 (2013.01); A61Q 19/00 (2013.01); C08F 220/58 (2013.01); C09D 133/26 (2013.01); A61Q 1/14 (2013.01); A61Q 5/00 (2013.01); A61Q 5/02 (2013.01); A61Q 17/04 (2013.01); A61Q 19/002 (2013.01); A61Q 19/004 (2013.01); A61Q 19/005 (2013.01); A61Q 19/008 (2013.01); A61Q 19/04 (2013.01); A61Q 19/06 (2013.01); C08F 220/28 (2013.01); C08F 222/385 (2013.01); C08F 2220/286 (2013.01);
Abstract

A self-reversible reverse latex, and its use as a thickener. The self-reversible reverse latex includes: 50%-70 of a cross-linked polyelectrolyte obtained by the polymerization of a monomer of formula (I), with R1 being 8 to 20 carbon atoms and 1≦n≦30 for a neutral monomer, and a monomer having an acid function; 4%-10% of a water-in-oil emulsifier; 1%-10% of an oil-in-water emulsifier including a surface-active composition (C); 15%-45% oil; and 0%-5% water. Composition (C) is 10%-50% composition (C) and 50%-90% composition(C). Composition(C) is 60%-100% of a composition of formula (II), with R2 being a 12 carbon alkyl, T, T, and Tbeing H or a (—CH—CH—O—)—H radical with 0≦mi≦10 and 0<Σmi≦10. Composition (C) is 60%-100% of a compound of formula (III) or mixtures of (III) and (IV), with R2 being as defined previously.


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