The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2015
Filed:
Jan. 23, 2014
National Chung Cheng University, Chiayi County, TW;
Huei-Yung Lin, Chia-Yi, TW;
Pu-Chuan Kang, Tainan, TW;
National Chung Cheng University, Chiayi County, TW;
Abstract
A focusing method having depth-of-field adaptability and aperture adaptability is provided. The method is applied to an image capture unit. A plurality of first images are captured in an image capture window according to a plurality of objects for obtaining a plurality of distances between the plurality objects and the image capture unit. Thereby, a focus distance of the image capture unit is given. Then, according to a maximum value and a minimum vale of the plurality of distances, the first aperture is adjusted to a second aperture, so that the image capture unit can acquire a complete depth of field by means of the second aperture and the focus distance. Accordingly, the preferred focus distance and depth of field satisfying the requirements for theme or special depth of field can be acquired. In addition, image capturing can be performed for a shorter exposure time.