The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Mar. 15, 2013
Applicants:

Yigong Wang, Rutland, MA (US);

Richard B. Cooper, Shrewsbury, MA (US);

Inventors:

Yigong Wang, Rutland, MA (US);

Richard B. Cooper, Shrewsbury, MA (US);

Assignee:

Allegro Microsystems, LLC, Worcester, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/06 (2006.01); H01L 27/22 (2006.01); H01L 29/82 (2006.01); H01L 43/14 (2006.01); G01R 33/07 (2006.01);
U.S. Cl.
CPC ...
H01L 43/065 (2013.01); G01R 33/077 (2013.01); H01L 43/14 (2013.01);
Abstract

A vertical Hall Effect element includes one or more of: a low voltage P-well region disposed at a position between pickups of the vertical Hall Effect element, Light-N regions disposed under the pickups, a pre-epi implant region, or two epi regions to result in an improved sensitivity of the vertical Hall Effect element. A method results in the vertical Hall Effect element having the improved sensitivity.


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