The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Jul. 12, 2011
Applicants:

Shingo Totani, Kiyosu, JP;

Masashi Deguchi, Kiyosu, JP;

Miki Moriyama, Kiyosu, JP;

Inventors:

Shingo Totani, Kiyosu, JP;

Masashi Deguchi, Kiyosu, JP;

Miki Moriyama, Kiyosu, JP;

Assignee:

TOYODA GOSEI CO., LTD., Kiyosu-Shi, Aichi-Ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/60 (2010.01); H01L 33/44 (2010.01); H01L 33/46 (2010.01); H01L 33/38 (2010.01);
U.S. Cl.
CPC ...
H01L 33/60 (2013.01); H01L 33/44 (2013.01); H01L 33/46 (2013.01); H01L 33/38 (2013.01); H01L 2933/0025 (2013.01);
Abstract

Sample A is produced by sequentially forming a first insulating film of SiOand a reflective film on a sapphire substrate. Sample B is produced by sequentially forming a first insulating film of SiO, a reflective film, and a second insulating film of SiOon a sapphire substrate. In both samples A and B, the reflectance of the reflective film was measured at a wavelength of 450 nm before and after heat treatment. Heat treatment was performed at 600° C. for three minutes. As shown in FIG., in Al/Ag/Al where Al has a thickness of 1 Å to 30 Å, Ag/Al where Al has a thickness of 20 Å, and Al/Ag/Al/Ag/Al where Al has a thickness of 20 Å, the reflectance was 95% or more, which is equivalent to or higher than that of Ag even after the heat treatment.


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