The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9099529 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 04, 2015

Filed:

Sep. 19, 2013
Applicant:

Stmicroelectronics S.r.l., Agrate Brianza, IT;

Inventors:

Vincenza Di Palma, Cimitile, IT;

Andrea Di Matteo, Naples, IT;

Luigi Giuseppe Occhipinti, Ragusa, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 35/24 (2006.01); H01L 29/00 (2006.01); H01L 21/768 (2006.01); H01L 21/321 (2006.01); H01L 51/00 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76805 (2013.01); H01L 21/32115 (2013.01); H01L 51/0023 (2013.01); H01L 51/0018 (2013.01); H01L 51/0516 (2013.01);
Abstract

The present disclosure relates to microstructure devices, in which a conductive pattern is formed on the basis of a conductive polymer material. In order to avoid the deposition and processing of the sacrificial materials and reduce a negative influence of the lithography process on sensitive conductive polymer materials a one-layer patterning sequence is proposed, in which a trench pattern is formed in a dielectric material that is subsequently filled with the conductive polymer material.


Find Patent Forward Citations

Di Palma, Vincenza. (2015). Method of forming a conductive polymer microstructure (U.S. Patent No. 9099529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9099529

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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