The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Mar. 07, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

David H. Allen, Rochester, MN (US);

Douglas M. Dewanz, Rochester, MN (US);

David P. Paulsen, Dodge Center, MN (US);

John E. Sheets, II, Zumbrota, MN (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 23/528 (2006.01); H01L 21/48 (2006.01); H01L 27/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 23/52 (2013.01); H01L 21/486 (2013.01); H01L 22/22 (2013.01); H01L 23/528 (2013.01); H01L 27/0207 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01); H01L 23/5286 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A multiple-patterned semiconductor device and a method of manufacture are provided. The semiconductor device includes one or more layers with signal tracks. The signal tracks have a quality characteristic. The semiconductor device also includes repeater banks to repower signals. The method of manufacture includes defining portions of layers with photomasks having signal track patterns, determining a quality characteristic of the signal track patterns, and selecting a photomask for etching vias.


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