logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9097991 B1

PDFFull Text
Date of Patent:
Aug. 04, 2015

Filed:

Mar. 14, 2013

Exposure apparatus, method of controlling the same and method of manufacturing device

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Noritoshi Sakamoto, Shimotsuga-gun, JP;

Assignee:

CANON KABUSHIKI KAISHA, , JP;

Attorney:

Rossi, Kimms & McDowell LLP

Primary Examiner:

Colin Kreutzer

Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/58 (2006.01); G03C 9/00 (2006.01); G03F 5/00 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01); G03F 7/70608 (2013.01); G03F 7/70633 (2013.01); G03F 9/7034 (2013.01); G03F 9/7084 (2013.01);
Abstract

An exposure apparatus exposes a resist on a substrate to light via an optical system. The exposure apparatus includes: a table configured to position the substrate at an exposure position upon holding the substrate; an obtaining unit configured to obtain a distance from an alignment mark formed on the substrate to a resist surface, and a tilt of the resist surface; and a control unit configured to calculate a correction value for correcting a shift in exposure position, that occurs upon tilt correction of the table, so as to reduce the tilt of the resist surface, using the distance and the tilt, and control a position of the table in accordance with the correction value.

Find Patent Forward Citations

Sakamoto, Noritoshi. (2015). Exposure apparatus, method of controlling the same and method of manufacturing device (U.S. Patent No. 9097991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9097991

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…