The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Feb. 20, 2013
Applicant:

E I Du Pont DE Nemours and Company, Wilmington, DE (US);

Inventors:

Edmund Francis Schieffer, Jr., Wilmington, DE (US);

Mark R. Mazur, West Chester, PA (US);

Assignee:

E I DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/20 (2013.01); G03F 7/202 (2013.01); G03F 7/2014 (2013.01);
Abstract

A relief printing form is prepared from a photosensitive element. An in-situ mask is formed and disposed above a photopolymerizable layer of the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between about 30,000 ppm and about 7500 ppm to form at least a polymerized portion and an unpolymerized portion of the layer, and the exposed element is processed by treating with at least one washout solution selected from solvent solution, aqueous solution, semi-aqueous solution, or water.


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