The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Feb. 14, 2013
Applicant:

Appleton Paper Inc., Appleton, WI (US);

Inventors:

Kelly John Caron, Suamico, WI (US);

Ruth Monica Prasetio, Appleton, WI (US);

Assignee:

APPVION, INC., Appleton, WI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 3/20 (2006.01); G01N 33/34 (2006.01);
U.S. Cl.
CPC ...
G01N 3/20 (2013.01); B65H 2220/01 (2013.01); B65H 2515/37 (2013.01); G01N 33/346 (2013.01); G01N 2203/0033 (2013.01); G01N 2203/0282 (2013.01); G01N 2203/0682 (2013.01);
Abstract

A method, and apparatus, for determining bend resistance of a sample includes applying a weight to a sample and measuring an amount of deflection of the sample caused by applying the weight. The sample is provided on a sample holder and an initial position of the sample is measured with respect to the sample holder. A weight is applied to the sample and a change in position from the initial position to a deflection position of the sample due to the weight applied to the sample is measured. An amount of deflection of the sample is determined by dividing the change in position by the basis weight.


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