The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2015

Filed:

Sep. 21, 2012
Applicant:

Unist Academy-industry Research Corporation, Ulsan, KR;

Inventors:

Sooiin Park, Ulsan, KR;

Jaephil Cho, Ulsan, KR;

Hyun-Kon Song, Ulsan, KR;

Byoungman Bang, Gyeongsan-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C08F 271/02 (2006.01); C08F 293/00 (2006.01); C08F 297/00 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C08F 293/00 (2013.01); B81C 1/00031 (2013.01); C08F 297/00 (2013.01); B81B 2203/0361 (2013.01); B81C 2201/0149 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm.


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