The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Feb. 24, 2012
Applicants:

Deoc Hwan Hyun, Daejeon, KR;

Jae Eock Cho, Daejeon, KR;

Dong Ho Lee, Daejeon, KR;

Gui Ryong Ahn, Daejeon, KR;

Hyun Cheol Ryu, Daejeon, KR;

Yong Hwa Lee, Seoul, KR;

Gang Ii Kim, Seoul, KR;

Inventors:

Deoc Hwan Hyun, Daejeon, KR;

Jae Eock Cho, Daejeon, KR;

Dong Ho Lee, Daejeon, KR;

Gui Ryong Ahn, Daejeon, KR;

Hyun Cheol Ryu, Daejeon, KR;

Yong Hwa Lee, Seoul, KR;

Gang II Kim, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 31/0236 (2006.01); H01L 31/068 (2012.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02363 (2013.01); H01L 31/068 (2013.01); H01L 31/1804 (2013.01); Y02E 10/52 (2013.01); Y02E 10/547 (2013.01);
Abstract

Provided is a method of manufacturing a solar cell, wherein a solar cell is manufactured by combining a damage removal etching process, a texturing process and an edge isolation process. The method is advantageous in that RIE and DRE are conducted, and then DRE/PSG and/or an edge isolation removal process are simultaneously conducted, so that the movement of a substrate (that is, a wafer) is minimized, thereby reducing the damage rate of the substrate.


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