The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Sep. 14, 2012
Applicant:

Kazutoyo Takano, Fukuoka, JP;

Inventor:

Kazutoyo Takano, Fukuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 29/739 (2006.01); H01L 21/266 (2006.01); H01L 29/78 (2006.01); H01L 21/225 (2006.01); H01L 29/06 (2006.01); H01L 29/36 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1095 (2013.01); H01L 21/2253 (2013.01); H01L 21/266 (2013.01); H01L 29/0615 (2013.01); H01L 29/0619 (2013.01); H01L 29/66333 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01); H01L 29/7811 (2013.01); H01L 29/06 (2013.01); H01L 29/0638 (2013.01); H01L 29/0696 (2013.01); H01L 29/36 (2013.01); H01L 29/42372 (2013.01);
Abstract

A semiconductor device including a semiconductor layer of a first conductivity type in a cell region, a first base layer of a second conductivity type on the semiconductor layer in the cell region; a second base layer of the second conductivity type on the semiconductor layer in an intermediate region; a conductive region of a first conductivity type in the first base layer; a gate electrode on a channel region placed between the conductive region and the semiconductor layer; a first electrode connected to the first and second base layers; a second electrode connected to the semiconductor layer; and a gate pad on the semiconductor layer via an insulating film in a pad region and connected to the gate electrode, an impurity concentration gradation in the gate pad side of the second base layer has a gentler VLD structure than an impurity concentration gradation in the first base layer.


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