The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Aug. 04, 2011
Applicants:
Xinyu Xu, Vancouver, WA (US);
Chang Yuan, Vancouver, WA (US);
Inventors:
Xinyu Xu, Vancouver, WA (US);
Chang Yuan, Vancouver, WA (US);
Assignee:
Sharp Laboratories of America, Inc., Camas, WA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30121 (2013.01); G06T 2207/30141 (2013.01);
Abstract
A system for identifying a repair cut location for a defect in a liquid crystal device includes receiving an input image, a defect mask image, and a landmark structure image. The system determines a repair cut location, based upon the input image, the defect mask image, and the landmark structure image, for a liquid crystal device proximate the defect. The determination may be based upon a type of said defect, a cause of said defect, a position of said defect, and a spatial relationship of the defect and a structure of the landmark image.