The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Sep. 24, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Junichi Nakagawa, Tokyo, JP;
Akitoshi Yamada, Yokohama, JP;
Nobutaka Miyake, Yokohama, JP;
Tomokazu Ishikawa, Yokohama, JP;
Shinjiro Hori, Yokohama, JP;
Fumitaka Goto, Tokyo, JP;
Ryosuke Iguchi, Kawasaki, JP;
Hidetsugu Kagawa, Kawasaki, JP;
Kouta Murasawa, Yokohama, JP;
Hiromitsu Akiba, Yokohama, JP;
Senichi Saito, Funabashi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Provided is a dither pattern generation method so that a dot arrangement having excellent dispersibility can be obtained in low-gradation areas for single colors and for mixed colors. The dither pattern generation method generates dot patterns for low-gradation areas having threshold values 1 to S so that high dispersibility is obtained in a cyan dot pattern and a magenta dot pattern, and so that in a combined dot pattern made by combining these dot patterns there are no overlapping pixels. The dither pattern generation method then sets threshold values for a cyan dither pattern and a magenta dither pattern based on these generated dot patterns.