The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Sep. 05, 2012
Applicants:

Corrado Accardi, Ragusa, IT;

Stella Loverso, Catania, IT;

Sebastiano Ravesi, Catania, IT;

Noemi Graziana Sparta, Catania, IT;

Inventors:

Corrado Accardi, Ragusa, IT;

Stella Loverso, Catania, IT;

Sebastiano Ravesi, Catania, IT;

Noemi Graziana Sparta, Catania, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/32 (2013.01); Y10T 428/24174 (2015.01); Y10T 428/24802 (2015.01);
Abstract

The disclosure relates to a three-dimensional integrated structure comprising a substrate and a plurality of projecting elements projecting from a flat surface thereof and obtained from a patterned and developed dry film photoresist. Advantageously, the three-dimensional integrated structure is highly defined, the projecting elements obtained by the patterned and developed dry film photoresist having a shape factor greater than 6. The three-dimensional integrated structure can be used to directly realize different type of electronic devices, such as microfluidic devices, microreactors or sensor devices.


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