The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Jan. 18, 2012
Applicant:
Osamu Nakayama, Niigata, JP;
Inventor:
Osamu Nakayama, Niigata, JP;
Assignee:
KURARAY CO., LTD., Kurashiki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 271/34 (2006.01); C07D 307/14 (2006.01); C07D 309/12 (2006.01); C08F 220/36 (2006.01); C08F 224/00 (2006.01); C08F 228/06 (2006.01); G03F 7/039 (2006.01); C07D 307/20 (2006.01); C07D 309/10 (2006.01); C08F 20/36 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 271/34 (2013.01); C07D 307/20 (2013.01); C07D 309/10 (2013.01); C08F 20/36 (2013.01); C08F 220/36 (2013.01); C07C 2101/04 (2013.01); C07C 2101/08 (2013.01); C07C 2101/14 (2013.01); C07C 2103/74 (2013.01); C08F 224/00 (2013.01); C08F 228/06 (2013.01); C08F 2220/365 (2013.01);
Abstract
Provided is a photoresist composition containing a polymer that contains, as a constituent unit, a specific methacrylic acid ester derivative. The photoresist composition can form a photoresist pattern with improved LWR and high resolution. More specifically, provided is an acrylic acid ester derivative represented by the following general formula (1):