The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Apr. 28, 2011
Applicant:

Jin Wuk Kim, Uiwang-si, KR;

Inventor:

Jin Wuk Kim, Uiwang-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01); H01L 21/02 (2006.01); H01L 21/312 (2006.01); H01L 21/67 (2006.01); H01L 51/56 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1333 (2013.01); H01L 21/0212 (2013.01); H01L 21/02288 (2013.01); H01L 21/3127 (2013.01); H01L 21/6715 (2013.01); G02F 2202/022 (2013.01); G02F 2202/28 (2013.01); H01J 2209/02 (2013.01); H01L 27/124 (2013.01); H01L 27/1292 (2013.01); H01L 51/56 (2013.01);
Abstract

A fabricating method and apparatus of a thin film pattern improves the reliability of forming the thin film pattern by a resist printing method. The apparatus includes a print roller device of a roll shape around which a blanket is wound; a spray device located around the print roller device for spraying an etch resist solution to the blanket; and a print plate of an engraved shape where a groove of a desired thin film shape and a projected part except the groove are formed, and the etch resist solution has a surfactant inclusive of an ethylene oxide fluorinated polymer material.


Find Patent Forward Citations

Loading…