The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Dec. 06, 2011
Applicant:
Su-hyun Park, Seoul, KR;
Inventor:
Su-Hyun Park, Seoul, KR;
Assignee:
LG DISPLAY CO., LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01); C08J 7/18 (2006.01); G21H 5/00 (2006.01); G02B 5/30 (2006.01); G02B 5/32 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); G02B 5/32 (2013.01);
Abstract
A method of fabricating a patterned retarder includes: forming a retarder material layer on a substrate by coating a retarder material; irradiating a first polarized UV ray onto the retarder material layer, the first polarized UV ray having a first polarization axis; irradiating a second polarized UV ray onto the retarder material layer, the second polarized UV ray having a second polarization axis perpendicular to the first polarization axis; and baking the retarder material layer to form first and second oriented patterns alternating with each other, each of the first and second oriented patterns having an anisotropic property.