The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
May. 02, 2011
Satoshi Hirata, Kodaira, JP;
Yoshitaka Bito, Kokubunji, JP;
Satoshi Hirata, Kodaira, JP;
Yoshitaka Bito, Kokubunji, JP;
HITACHI MEDICAL CORPORATION, Tokyo, JP;
Abstract
An object of the present invention is to provide a measuring technique which allows in the MRS measurement to suppress with a high degree of precision, incorporation of a signal of unwanted compounds which hinders measurement of a measurement object signal, independent of an imaging object region and the measurement object signal, thereby obtaining a stable and favorable signal spectrum. In the MRS measuring sequence, a spectrum selective inversion RF pulse, having a narrow band characteristic for selectively inverting only a signal peak of a compounds to be suppressed, and phase dispersion-refocusing GC pulses are applied at least one of before and after a region selective RF pulse. This MRS measuring sequence is repeated while changing the echo time TE at predetermined intervals, and nuclear magnetic resonance signals being obtained by the repetition are integrated. The amount of the spectrum selective inversion RF pulse to be applied may be changed according to the echo time TE.