The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Oct. 30, 2013
Applicant:

Swnr Development, Llc, Pagosa Springs, CO (US);

Inventors:

William Thomas Woods, II, Lantana, TX (US);

Douglas Stanley Lumb, Methuen, MA (US);

Daniel L. English, Pagosa Springs, CO (US);

Assignee:

SWNR Development, LLC, Pagosa Springs, CO (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 7/08 (2006.01); B29C 65/00 (2006.01); B32B 37/00 (2006.01); C08J 5/00 (2006.01); C09J 7/00 (2006.01); B32B 3/06 (2006.01); B32B 9/00 (2006.01); D06M 17/10 (2006.01); B32B 5/06 (2006.01); B29C 65/02 (2006.01); B29C 65/48 (2006.01); B29C 65/62 (2006.01); B29C 65/72 (2006.01); B32B 27/12 (2006.01); B32B 37/04 (2006.01); B32B 37/12 (2006.01);
U.S. Cl.
CPC ...
D06M 17/10 (2013.01); B32B 5/06 (2013.01); B29C 65/02 (2013.01); B29C 65/4815 (2013.01); B29C 65/62 (2013.01); B29C 65/72 (2013.01); B32B 7/08 (2013.01); B32B 27/12 (2013.01); B32B 37/04 (2013.01); B32B 2037/1223 (2013.01); Y10T 428/24033 (2015.01);
Abstract

Methods of forming a stitched multi-layer fabric are provided. An embodiment method includes stitching an interior layer to a barrier layer, the interior layer comprising a first non-waterproof fabric and the barrier layer configured to inhibit fluid flow, disposing a face layer over the barrier layer without contacting the interior layer, the face layer comprising a second non-waterproof fabric, and melting a portion of the barrier layer to bond the face layer to the barrier layer and to fill stitch holes formed in the barrier layer during the stitching.


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