The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Oct. 08, 2009
Thomas G. Mason, Los Angeles, CA (US);
Thomas G. Mason, Los Angeles, CA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
A method for producing particles includes providing a relief template having a surface relief pattern adapted to impart structure to a plurality of particles while they are under production; depositing a radiation-sensitive material on the relief template; exposing portions of the radiation-sensitive material on the relief template using a beam of spatially patterned radiation; removing portions of the radiation-sensitive material after the exposing to reveal at least portions of surfaces of the plurality of particles; and separating at least a portion of the plurality of particles from the relief template. At least a portion of a structure of each of the plurality of particles is defined by a combination of the surface relief pattern and the spatially patterned radiation.