The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2015

Filed:

Nov. 04, 2006
Applicants:

Dieter Pfitzner, Weil der Stadt, DE;

Tim Hesse, Ditzingen, DE;

Winfried Magg, Ditzingen, DE;

Inventors:

Dieter Pfitzner, Weil der Stadt, DE;

Tim Hesse, Ditzingen, DE;

Winfried Magg, Ditzingen, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); B23K 26/03 (2006.01); G01J 5/60 (2006.01); G01J 5/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/03 (2013.01); B23K 26/032 (2013.01); B23K 26/034 (2013.01); G01J 5/602 (2013.01); G01J 2005/0077 (2013.01);
Abstract

A method for monitoring a processing region of a workpiece on which laser processing is being carried out, in which method the radiation emitted by the processing region is detected by a detector system in a space-resolved manner, wherein the radiation of the processing region is detected for each elemental area of the processing region imaged onto the detector system at least two wavelengths simultaneously. Accurate process monitoring may thereby be carried out.


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