The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

May. 29, 2013
Applicant:

Joled Inc., Tokyo, JP;

Inventors:

Yuji Kishida, Hyogo, JP;

Eiichi Satoh, Hyogo, JP;

Takahiro Kawashima, Osaka, JP;

Assignee:

JOLED INC., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/66 (2006.01); H01L 27/12 (2006.01); H01L 21/768 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 29/786 (2013.01); H01L 21/76829 (2013.01); H01L 27/1248 (2013.01); H01L 29/66742 (2013.01); H01L 29/66765 (2013.01); H01L 27/3262 (2013.01);
Abstract

A thin-film transistor includes: a gate electrode above a substrate; a gate insulating layer above the gate electrode; a semiconductor layer opposed to the gate electrode with the gate insulating layer therebetween; a protective layer above the semiconductor layer and comprising an organic material; and a source electrode and a drain electrode each of which has at least a portion located above the protective layer. The protective layer includes an altered layer which has at least a portion contacting the semiconductor layer, and which is generated by alteration of a surface layer of the protective layer in a region exposed from the source electrode and the drain electrode. A relational expression of LogNt≦0.0556θ+16.86 is satisfied where Nt (cm) represents a defect density of the semiconductor layer and θ (°) represents a taper angle of an edge portion of the protective layer.


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