The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Mar. 17, 2015
Applicant:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Inventor:

Yuya Matsuda, Mie, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/28 (2006.01); H01L 21/768 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 27/115 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76895 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); H01L 21/3088 (2013.01); H01L 27/11521 (2013.01);
Abstract

According to one embodiment, a first core pattern is formed in a wiring portion on a process target film and a second core pattern, which is led out from the first core pattern and includes an opening, is formed in a leading portion on the process target film, a sidewall pattern is formed along an outer periphery of the first core pattern and the second core pattern and a sidewall dummy pattern is formed along an inner periphery of the opening of the second core pattern, the first core pattern and the second core pattern are removed, and the process target film is processed to transfer the sidewall pattern and the sidewall dummy pattern.


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