The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Aug. 29, 2013
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Yuko Kono, Tokyo, JP;
Kazuyuki Masukawa, Kanagawa-ken, JP;
Toshiya Kotani, Tokyo, JP;
Chikaaki Kodama, Tokyo, JP;
Yasunobu Kai, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Minatu-ku, JP;
Abstract
According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition.