The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Mar. 28, 2012
Applicants:

Peng-fei Fu, Midland, MI (US);

Eric S. Moyer, Midland, MI (US);

Jason Suhr, Coleman, MI (US);

Inventors:

Peng-Fei Fu, Midland, MI (US);

Eric S. Moyer, Midland, MI (US);

Jason Suhr, Coleman, MI (US);

Assignee:

DOW CORNING CORPORATION, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01);
Abstract

A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.


Find Patent Forward Citations

Fu, Peng-Fei. (2015). Photo-patternable and developable silsesquioxane resins for use in device fabrication (U.S. Patent No. 9086626). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9086626

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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