The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Sep. 27, 2013
Avago Technologies General Ip (Singapore) Pte. Ltd., Singapore, SG;
Jack Ajoian, Campbell, CA (US);
Avago Technologies General IP (Singapore) Pte. Ltd., Singapore, SG;
Abstract
A method is provided for fabricating a substrate having multiple metal layers separated by one or more dielectric layers, respectively. The method includes forming a cavity in at least one dielectric layer through an exposed portion of a top dielectric layer of the substrate, applying metal to side and bottom surfaces of the cavity, forming a pattern through a portion of the metal applied to the bottom surface of the cavity, and micro-etching the metal applied to the bottom surface of the cavity. The micro-etching extends the pattern through a remaining portion of the metal applied to the bottom surface of the cavity.