The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2015

Filed:

Apr. 17, 2014
Applicant:

Hoya Corporation, Tokyo, JP;

Inventors:

Shinji Eda, Tokyo, JP;

Hideki Isono, Tokyo, JP;

Assignee:

HOYA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/00 (2006.01); C03B 11/08 (2006.01); C03B 11/05 (2006.01); G11B 5/84 (2006.01); B24B 41/06 (2012.01); G11B 5/735 (2006.01); G11B 5/73 (2006.01); C03B 11/00 (2006.01); C03B 11/12 (2006.01);
U.S. Cl.
CPC ...
C03B 11/05 (2013.01); B24B 41/06 (2013.01); C03B 11/088 (2013.01); G11B 5/735 (2013.01); G11B 5/8404 (2013.01); C03B 11/005 (2013.01); C03B 11/08 (2013.01); C03B 11/125 (2013.01); G11B 5/7315 (2013.01);
Abstract

The present invention provides a method for efficiently manufacturing a glass substrate for magnetic disk having good accuracy of a surface irregularity and an impact resistance. The method includes the steps of: performing press forming to molten glass to prepare a sheet glass material, the sheet glass material having a roughness of the principal surface of 0.01 μm or less and target flatness of a glass substrate for magnetic disk; chemically strengthening the sheet glass material by dipping the sheet glass material in a chemically strengthening salt, thereby preparing a disk substrate; polishing the principal surfaces of the disk substrate. A thickness of the sheet glass material prepared in the press forming step is larger than a target thickness of the glass substrate for magnetic disk by a polishing quantity of the principal surface polishing step.


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