The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Feb. 20, 2013
Hitachi, Ltd., Tokyo, JP;
Fumiaki Noda, Tokyo, JP;
Takahiro Yamada, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
To provide a preferred device configuration and arrangement capable of forming a large irradiation field, miniaturizing a gantry and reducing weight of the gantry. A gantry includes a bending magnet configured to bend a beam orbit, a plurality of horizontal direction scanning magnets which are first scanning magnets configured to scan the beam orbit in a horizontal direction which is a first direction, and a vertical direction scanning magnet which is a second scanning magnet configured to scan the beam orbit in a vertical direction which is a second direction. The plurality of horizontal direction scanning magnets is arranged so that θ is equal to or less than 90° when it is assumed that a phase difference between the horizontal direction scanning magnets is 180n°±θ. The bending magnet is arranged between the plurality of horizontal direction scanning magnets.