Process device for processing in particular stacked processed goods

Abstract

A processing device for processing stacked processed goods for the production of conducting, semiconducting, or insulating thin layers includes, in at least one embodiment, an evacuatable process chamber configured to receive a process gas. A tempering device keeps at least a partial region of a wall of the evacuatable process chamber at a predetermined first temperature during at least part of the processing. The first temperature is between a second temperature that is room temperature and a third temperature, generated in the evacuatable process chamber, that is above room temperature. A heated gas flow cycle flows through a gas guiding device in the evacuatable process chamber. The stacked processed goods are insertable through a lockable loading opening into the gas guiding device, and a gas inlet device feeds the process gas into the gas flow cycle. A process system may further include a cooling device and/or a channeling device.