The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2015

Filed:

Aug. 16, 2013
Applicant:

Toho Engineering Co., Ltd., Yokkaichi-shi, JP;

Inventors:

Tatsutoshi Suzuki, Yokkaichi, JP;

Eisuke Suzuki, Yokkaichi, JP;

Daisuke Suzuki, Yokkaichi, JP;

Assignee:

TOHO ENGINEERING CO., LTD., Yokkaichi-Shi, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); B24B 37/30 (2012.01); B24B 57/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B24B 37/30 (2013.01); B24B 57/02 (2013.01);
Abstract

A substrate polishing apparatus includes a retainer for holding a substrate and substrate rotating device that spins the retainer around a first rotational axis perpendicular to a to-be-polished surface of the substrate. A platen includes an abrasive pad disposed opposite of the to-be-polished surface of the substrate. A platen rotating device spins the platen around a second rotational axis perpendicular to the abrasive pad. A liquid storage chamber includes a wall portion surrounding the outer periphery of the substrate. One end of the wall portion is positionable in a liquid-tight manner with the abrasive pad to define a liquid storage space for retaining a polishing liquid around the outer periphery of the substrate.


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