The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
May. 15, 2014
Applicant:
Imec, Leuven, BE;
Inventor:
Clement Merckling, Schaarbeek, BE;
Assignee:
IMEC, Leuven, BE;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/331 (2006.01); H01L 21/4763 (2006.01); H01L 29/06 (2006.01); H01L 31/0336 (2006.01); H01L 21/02 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02538 (2013.01); H01L 21/0245 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02461 (2013.01); H01L 21/02463 (2013.01); H01L 21/02543 (2013.01); H01L 21/02546 (2013.01); H01L 21/02549 (2013.01); H01L 21/02612 (2013.01); H01L 21/02636 (2013.01); H01L 29/20 (2013.01);
Abstract
The disclosure relates to a method for manufacturing a III-V device and the III-V device obtained therefrom. The method comprises providing a semiconductor substrate including at least a recess area and forming a buffer layer overlying the semiconductor substrate in the recess area. The buffer layer includes a binary III-V compound formed at a first growth temperature by selective epitaxial growth from a group III precursor and a group V precursor in the presence of a carrier gas. The first growth temperature is equal or slightly higher than a cracking temperature of each of the group III precursor and of the group V precursor.