The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2015

Filed:

Dec. 14, 2009
Applicants:

Shinjirou Suzuki, Matsumoto, JP;

Yoichi Nakamura, Matsumoto, JP;

Ikuo Takaki, GuangDong, CN;

Seizo Kitagawa, Matsumoto, JP;

Kazuki Nebashi, Matsumoto, JP;

Inventors:

Shinjirou Suzuki, Matsumoto, JP;

Yoichi Nakamura, Matsumoto, JP;

Ikuo Takaki, GuangDong, CN;

Seizo Kitagawa, Matsumoto, JP;

Kazuki Nebashi, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G 5/04 (2006.01); G03G 5/14 (2006.01);
U.S. Cl.
CPC ...
G03G 5/142 (2013.01); G03G 5/144 (2013.01);
Abstract

Provided is an electrophotographic photoconductor that has good coating solution stability and metal oxide dispersibility, is free of image defects including ground fogging and black spots, and affords good image characteristics in various environments, as well as a manufacturing method therefore and a device including the same. The electrophotographic photoconductor includes a conductive substrate; an undercoat layer; and a photosensitive layer. The undercoat layer contains, as a main component, a resin obtained by polymerizing, as starting materials, an aromatic dicarboxylic acid, at least one aliphatic dicarboxylic acid having 8 or more carbon atoms, and at least one diamine having a cycloalkane structure, and further contains a metal oxide. The aromatic dicarboxylic acid in the resin is present in an amount that ranges from 0.1 to 10 mol %, and the resin has an acid value and a base value that are each no greater than 10 KOH mg/g.


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