The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2015

Filed:

Jun. 21, 2013
Applicant:

The Arizona Board of Regents on Behalf of the University of Arizona, Tucson, AZ (US);

Inventors:

Barry Gelernt, Oceanside, CA (US);

Thomas D. Milster, Tucson, AZ (US);

Thiago Jota, Tucson, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/16 (2006.01); G01N 21/45 (2006.01); G01J 3/10 (2006.01); G01J 3/453 (2006.01); G01J 3/02 (2006.01);
U.S. Cl.
CPC ...
G02B 21/16 (2013.01); G01J 3/0208 (2013.01); G01J 3/10 (2013.01); G01J 3/453 (2013.01); G01N 21/45 (2013.01); G01N 2021/451 (2013.01);
Abstract

Optical systems and methods including interferometric systems and methods are disclosed herein. In some embodiments, the present invention relates to a system comprising at least one light source including a deep ultraviolet light source, a lens device, a beam splitter, and a camera device. The lens device receives first light, directs at least some of that light toward a target location, receives reflected light therefrom, and directs at least some of the reflected light toward a further location, where at least part of a light path between the deep ultraviolet light source and the target location is other than at a high vacuum. The camera device is positioned at either the further location or an additional location, whereby an image is generated by the camera device based upon at least a portion of the reflected light. Also encompassed herein are interferometric lithography and optical microscopy systems.


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