The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Mar. 30, 2011
Hiromichi Yamazui, Kanagawa, JP;
Keisuke Kobayashi, Ibaraki, JP;
Hideo Iwai, Ibaraki, JP;
Masaaki Kobata, Ibaraki, JP;
Hiromichi Yamazui, Kanagawa, JP;
Keisuke Kobayashi, Ibaraki, JP;
Hideo Iwai, Ibaraki, JP;
Masaaki Kobata, Ibaraki, JP;
National Institute for Materials Science, Ibaraki, JP;
Ulvac-PHI, Inc., Kanagawa, JP;
Abstract
[Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device. [Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.