The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Jan. 27, 2012
Youssef Loldj, Sunnyvale, CA (US);
Jay J. Jung, Sunnyvale, CA (US);
Mehran Moalem, Cupertino, CA (US);
Paul E. Fisher, Los Altos, CA (US);
Joshua Putz, Fairfield, CA (US);
Andreas Neuber, Stuttgart, DE;
Youssef Loldj, Sunnyvale, CA (US);
Jay J. Jung, Sunnyvale, CA (US);
Mehran Moalem, Cupertino, CA (US);
Paul E. Fisher, Los Altos, CA (US);
Joshua Putz, Fairfield, CA (US);
Andreas Neuber, Stuttgart, DE;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.