The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
Dec. 21, 2011
Applicants:
Yasuhiro Yoneda, Wakayama, JP;
Kanji Sato, Wakayama, JP;
Inventors:
Yasuhiro Yoneda, Wakayama, JP;
Kanji Sato, Wakayama, JP;
Assignee:
KAO CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/00 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); G11B 5/84 (2006.01); B01D 39/00 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1463 (2013.01); G11B 5/8404 (2013.01);
Abstract
Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing composition including a step of filtering with a filtration filter a silica particle dispersion containing colloidal silica whose primary particles have an average particle diameter in a range of 1 to 100 nm, wherein the filtration filter includes diatomite cationized by use of a polyvalent amine compound having 9 to 200 cationic groups in the molecule.