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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9079289 B1

PDFFull Text
Date of Patent:
Jul. 14, 2015

Filed:

Aug. 24, 2012

Polishing pad

Applicants:

Akinori Sato, Osaka, JP;

Masato Doura, Osaka, JP;

Inventors:

Akinori Sato, Osaka, JP;

Masato Doura, Osaka, JP;

Assignee:

TOYO TIRE & RUBBER CO., LTD., Osaka-Shi, JP;

Attorney:

Law Office of Katsuhiro Arai

Primary Examiner:

George Nguyen

Int. Cl.
CPC ...
B24B 37/20 (2012.01); B24B 37/24 (2012.01); C08G 18/48 (2006.01); C08G 18/66 (2006.01); C08G 18/72 (2006.01); C08G 18/79 (2006.01); C08G 18/12 (2006.01); C08G 18/28 (2006.01); C08G 18/40 (2006.01); C08G 18/42 (2006.01); B24B 37/04 (2012.01); C08G 18/32 (2006.01); C08G 18/76 (2006.01); H01L 21/304 (2006.01); C08G 18/75 (2006.01); C08G 18/38 (2006.01); C08G 101/00 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/042 (2013.01); C08G 18/12 (2013.01); C08G 18/2835 (2013.01); C08G 18/3206 (2013.01); C08G 18/3243 (2013.01); C08G 18/3814 (2013.01); C08G 18/4018 (2013.01); C08G 18/4277 (2013.01); C08G 18/4854 (2013.01); C08G 18/664 (2013.01); C08G 18/6674 (2013.01); C08G 18/724 (2013.01); C08G 18/758 (2013.01); C08G 18/7621 (2013.01); C08G 18/792 (2013.01); C08G 18/797 (2013.01); H01L 21/304 (2013.01); C08G 2101/00 (2013.01);
Abstract

The purpose of the present invention is to provide: a polishing pad which has improved dressing properties, while maintaining the hardness; or a polishing pad which does not easily make a scratch on the surface of an object to be polished, while having improved dressing properties. A polishing pad of the present invention is characterized by having a polishing layer that is formed of a polyurethane resin foam or an unfoamed polyurethane resin, and is also characterized in that the polyurethane resin foam or the unfoamed polyurethane resin contains, as starting material components, (A) an isocyanate component, (B) a polyol component and (C) an aromatic compound that has one hydroxyl group and/or an aromatic compound that has one amino group.

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