The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2015

Filed:

Apr. 04, 2007
Applicants:

Seong Jae Choi, Gyeonggi-do, KR;

Jae Young Choi, Gyeonggi-do, KR;

Eun Joo Jang, Gyeonggi-do, KR;

Bulliard Xavier, Seoul, KR;

Yu Jin Kang, Seoul, KR;

Wan Ki Bae, Seoul, KR;

Kook Heon Char, Seoul, KR;

Inventors:

Seong Jae Choi, Gyeonggi-do, KR;

Jae Young Choi, Gyeonggi-do, KR;

Eun Joo Jang, Gyeonggi-do, KR;

Bulliard Xavier, Seoul, KR;

Yu Jin Kang, Seoul, KR;

Wan Ki Bae, Seoul, KR;

Kook Heon Char, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/04 (2006.01); H05C 1/00 (2006.01); B22F 1/00 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
B22F 1/0088 (2013.01); B22F 2998/00 (2013.01); H01L 51/0036 (2013.01); Y10T 428/268 (2015.01);
Abstract

Methods for producing nanoparticle thin films are disclosed. According to one of the methods, a nanoparticle thin film is produced by modifying the surface of nanoparticles to allow the nanoparticles to be charged, controlling an electrostatic attractive force between the charged nanoparticles and a substrate and a repulsive force between the individual nanoparticles by a variation in pH to control the number density of the nanoparticles arranged on the substrate.


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