The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2015

Filed:

Jun. 20, 2009
Applicants:

Michael Jacob, Weimar, DE;

Karlheinz Rümpler, Weimar, DE;

Frank Ohlendorf, Kerspleben, DE;

Tilo Klöppel, Weimar-Taubach, DE;

Inventors:

Michael Jacob, Weimar, DE;

Karlheinz Rümpler, Weimar, DE;

Frank Ohlendorf, Kerspleben, DE;

Tilo Klöppel, Weimar-Taubach, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01F 13/02 (2006.01); B01J 2/16 (2006.01);
U.S. Cl.
CPC ...
B01J 2/16 (2013.01);
Abstract

A method and an associated apparatus for treating fine-grained material in a spouted bed. Here, the method and design for an associated apparatus for treating fine-grained material in a spouted bed eliminate the drawbacks of the prior art, allow different process conditions in the process chamber to be adjusted in a regulated manner, and has a simple and inexpensive structure. The method is provides that a nearly circular gas flow of the fluidizer is generated in the process chamber () by an external annular gap () lying on the y-z plane, the diameter of the nearly circular gas flow expands outward in the direction of the x axis inside the process chamber (), and a nearly circular gas flow of the fluidizer is generated by an internal annular gap () lying on the y-z plane, the diameter of the nearly circular gas flow expands inward within the process chamber (). A displacement member () and an annular central contour () are centrally disposed in the lower region of the process chamber () in such a way that an internal annular gap () is formed between the displacement member () and the inner contour of the annular central contour (), while an external annular gap () is formed between the outer contour of the annular central contour () and the lower outer edge of the process chamber () in order to feed the fluidizer.


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