The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Dec. 06, 2013
Applicant:
Tamkang University, New Taipei, TW;
Inventor:
I-Nan Lin, Taipei, TW;
Assignee:
Tamkang University, New Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/48 (2006.01); C23C 16/02 (2006.01); C23C 16/27 (2006.01);
U.S. Cl.
CPC ...
H05H 1/48 (2013.01); C23C 16/0272 (2013.01); C23C 16/274 (2013.01);
Abstract
A plasma-generating device includes an anode plate and a cathode plate spaced apart from the anode plate. The cathode plate includes a substrate and a hybrid diamond layer formed on the substrate. The hybrid diamond layer includes ultra-nanocrystalline diamond grains, an amorphous carbon disposed among and bonded to the ultra-nanocrystalline diamond grains, micro-crystalline diamond grains disposed among the ultra-nanocrystalline diamond grains, and a graphite phase disposed among the ultra-nanocrystalline diamond grains. Each of the micro-crystalline diamond grains is surrounded by the graphite phase.