The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Aug. 07, 2014
Applicant:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Inventors:
Assignee:
SAMSUNG DISPLAY CO., LTD., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 27/12 (2006.01); G03F 7/031 (2006.01); G03F 7/075 (2006.01); G03F 7/00 (2006.01); G02B 1/12 (2006.01); G02B 5/30 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G03F 7/031 (2013.01); G03F 7/0757 (2013.01); G03F 7/0002 (2013.01); G02B 1/12 (2013.01); G02B 5/3058 (2013.01); G02F 1/133528 (2013.01); G02F 2001/133548 (2013.01);
Abstract
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.