The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Oct. 31, 2011
Jun Woo Lee, Seongnam-si, KR;
Soo-ryun Cho, Gunpo-si, KR;
Baek Kyun Jeon, Yongin-si, KR;
Joo Seok Yeom, Seoul, KR;
Suk Hoon Kang, Seoul, KR;
Kyoung Tae Kim, Osan-si, KR;
Jun Woo Lee, Seongnam-si, KR;
Soo-Ryun Cho, Gunpo-si, KR;
Baek Kyun Jeon, Yongin-si, KR;
Joo Seok Yeom, Seoul, KR;
Suk Hoon Kang, Seoul, KR;
Kyoung Tae Kim, Osan-si, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
The present invention is directed to an exposure apparatus and photo-mask, and method for manufacturing liquid crystal display using the same. An exposure apparatus according to an exemplary embodiment of the present invention provides an exposure apparatus which includes: a first photo-mask comprising a plurality of transmission parts; and a second photo-mask comprising a plurality of transmission parts, the first photo-mask and the second photo-mask comprising an overlapping region where the first photo-mask and the second photo-mask are partially overlapped, wherein at least one transmission part included in at least one of the first photo-mask and the second photo-mask in the overlapping region comprises a semi-transmission section, and a transmittance of the semi-transmission section is greater than or equal to 0% and less than 100%.