The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
May. 16, 2012
Rosanne Williamson Slingsby, Pleasanton, CA (US);
Jing Hong, Cupertino, CA (US);
Douglas M. Jamieson, Patterson, CA (US);
Christopher A. Pohl, Union City, CA (US);
Rosanne Williamson Slingsby, Pleasanton, CA (US);
Jing Hong, Cupertino, CA (US);
Douglas M. Jamieson, Patterson, CA (US);
Christopher A. Pohl, Union City, CA (US);
DIONEX CORPORATION, Sunnyvale, CA (US);
Abstract
A surrogate addition device is described that adds a surrogate compound at a uniform transport rate to a flowing sample stream. The surrogate addition device includes a surrogate reservoir, a flow chamber, and a diffusion barrier. The surrogate reservoir can be configured to contain a surrogate solution where the surrogate solution includes a surrogate compound. The flow chamber includes an inlet port and an outlet port. At least a portion of the diffusion barrier is disposed in between the surrogate reservoir and the flow chamber. The diffusion barrier may include an inner surface that forms a wall of the surrogate reservoir, and an outer surface that forms a wall of the flow chamber. The flow chamber can be configured to receive a flowing sample solution across the outer surface of the diffusion barrier and also to diffuse the surrogate compound from the surrogate reservoir to the flow chamber.