The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2015

Filed:

Apr. 25, 2013
Applicants:

Samsung Display Co., Ltd., Yongin, KR;

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Eun-Ae Kwak, Gunpo-si, KR;

Min-Hyuck Kang, Seoul, KR;

Su Mi Lee, Hwaseong-si, KR;

Jun Han Lee, Incheon, KR;

Moon Gyu Lee, Suwon-si, KR;

Joona Bang, Seoul, KR;

Hyun Jung Jung, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C08J 7/04 (2006.01); G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
C08J 7/04 (2013.01); G03F 7/0002 (2013.01); G03F 7/26 (2013.01);
Abstract

An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.


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