The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Apr. 27, 2012
Taichiro Touge, Hiratsuka, JP;
Tomohiko Hakamata, Hamamatsu, JP;
Hideki Nara, Fujisawa, JP;
TAKASAGO INTERNATIONAL CORPORATION, Tokyo, JP;
Abstract
The present invention provides a method for producing a compound represented by general formula (1) (wherein R, R, R, R-R, A-A, nand nare as defined in the description), which is characterized by reacting a compound represented by general formula (2) (wherein R-R, A-A, n, nand B are as defined in the description) with a diamine compound represented by general formula (3) (wherein R-Rare as defined in the description). The present invention is a method for producing a diamine compound, which is useful for the formation of a ruthenium-diamine complex, under mild conditions, said method being able to be put in industrial practice.