The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Jan. 04, 2008
Nicolas Nadaud, Paris, FR;
Andriy Kharchenko, Palaiseau, FR;
Ulrich Billert, La Celle Saint-Cloud, FR;
Rene GY, Bondy, FR;
Nicolas Nadaud, Paris, FR;
Andriy Kharchenko, Palaiseau, FR;
Ulrich Billert, La Celle Saint-Cloud, FR;
Rene Gy, Bondy, FR;
SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;
Abstract
One subject of the invention is a process for the treatment of at least one thin continuous film deposited on a first side of a substrate, characterized in that said at least one thin film is raised to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. on the opposite side of said substrate to said first side, so as to increase the degree of crystallization of said thin film while keeping it continuous and without a step of melting said thin film. Another subject of the invention is the material that can be obtained by this process.