The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2015

Filed:

Jul. 03, 2009
Applicants:

Mir Mahmood Sarshar, Beaconsfield, GB;

Mirza Najam Ali Beg, Milton Keynes, GB;

Carl Wordsworth, Bedford, GB;

Inventors:

Mir Mahmood Sarshar, Beaconsfield, GB;

Mirza Najam Ali Beg, Milton Keynes, GB;

Carl Wordsworth, Bedford, GB;

Assignee:

Caltec Limited, Cranfield, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/24 (2006.01); B01D 17/035 (2006.01); B01D 17/038 (2006.01); B03D 1/14 (2006.01); B04C 3/04 (2006.01); B01D 17/02 (2006.01); B04C 3/06 (2006.01); B04C 5/26 (2006.01); B04C 7/00 (2006.01); B04C 9/00 (2006.01);
U.S. Cl.
CPC ...
B04C 3/04 (2013.01); B01D 17/0205 (2013.01); B04C 3/06 (2013.01); B03D 1/1418 (2013.01); B01D 17/0217 (2013.01); C02F 1/24 (2013.01); B03D 1/1425 (2013.01); B04C 5/26 (2013.01); B04C 7/00 (2013.01); B04C 9/00 (2013.01); B04C 2009/008 (2013.01);
Abstract

An apparatus for separating a fluid mixture includes a uniaxial cyclonic separator () having a separation chamber () for separating the fluid mixture by cyclonic action into a first fluid and a second fluid. An inlet () is located at a first end of the separation chamber () for receiving a fluid mixture, while a first outlet () for the first fluid and a second outlet () for the second fluid are located at a second end of the separation chamber. A gas injection means () is provided for injecting a gas into the fluid mixture to aid separation within the separation chamber (). The gas injection may also be through an annular chamber surrounding the separator chamber (). The gas in this case is introduced through a porous mediumvia a gas supply line


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