The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Jul. 26, 2011
Sin Young Kim, Daejeon, KR;
Kyung Ki Hong, Chungcheongbukdo, KR;
Hyuk Yoon, Gwangmyeong-si, KR;
Won Cheul Ju, Chungcheongbuk-do, KR;
Yong IL Cho, Goyang-si, KR;
Moon Soo Park, Daejeon, KR;
Dong Ho Ko, Cheongju-si, KR;
Su Young Ryu, Daejeon, KR;
Sin Young Kim, Daejeon, KR;
Kyung Ki Hong, Chungcheongbukdo, KR;
Hyuk Yoon, Gwangmyeong-si, KR;
Won Cheul Ju, Chungcheongbuk-do, KR;
Yong Il Cho, Goyang-si, KR;
Moon Soo Park, Daejeon, KR;
Dong Ho Ko, Cheongju-si, KR;
Su Young Ryu, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.