The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Aug. 23, 2012
Edmund Francis Schieffer, Jr., Wilmington, DE (US);
Marcia Jungran Cho, Newark, DE (US);
Edmund Francis Schieffer, Jr., Wilmington, DE (US);
Marcia Jungran Cho, Newark, DE (US);
E I DU PONT DE NEMOURS AND COMPANY, Wilmington, DE (US);
Abstract
The invention provides a method for preparing a relief printing form from a photosensitive element. The method includes forming an in-situ mask disposed above a photopolymerizable layer of the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between about 50,000 ppm and about 2000 ppm to form at least a polymerized portion and an unpolymerized portion of the layer, and treating by heating the exposed element to a temperature sufficient to cause the unpolymerized portion to melt, soften, or flow.